Discover Our High-Quality Hafnium Amino Metal Compounds for CVD and ALD Applications

18-Sep-2024

Introduce our company's high-quality hafnium amino metal compounds, which are essential materials for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These compounds se...

Revolutionize Your Thin Film Deposition Process with Our High-Quality Hafnium Amino Metal Compounds

18-Sep-2024

Hafnium amino metal compounds are essential precursors for depositing hafnium and preparing hafnium oxide films. Our products, including Hafnium tetradimethylamide CAS: 19782-68-4,Tetrakis(diethyla...

High-purity amino metal compounds are essential for advanced materials in various fields!

18-Sep-2024

Amino metal compounds are primarily used as precursors for high-k materials, with a purity level of up to 5N. Leveraging advanced deposition techniques such as ALD and CVD, we are able to produce n...

Introducing our company's high-purity amino metal compounds

18-Sep-2024

Our amino metal compounds boast a purity level of up to 5N, making them ideal as precursors for high-k materials. These compounds could be effectively utilized in various deposition techniques such...